The 1st International Conference on ALD Applications ∧ 2nd China ALD conference will be a two-day meeting, dedicated to the fundamental, materials, and applications of Atomic Layer Deposition (ALD) technology. It will be held in Shanghai, China, from October 15 to 16, 2012. Following the success of the 1st China ALD Scientific Meeting in 2010, the 2nd China ALD 2012 conference will feature plenary sessions, poster sessions and an industrial exhibition. Papers submitted by students will be eligible for the ¡°Best Student Paper Awards¡±, which is co-sponsored by Springer ($400 each for purchasing Springer books)and Picosun (One Ipad).

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Poster size: 1m(width) x 1.5m (height)

IMPORTANT DATES

September 15, 2012¡ªAbstract Submission Ends

Please submit your abstract for Oral or Poster presentation to the Organization Committee via sjding[at]fudan.edu.cn or yfm[at]fudan.edu.cn.

September 20, 2012¡ªPreregistration Opens(Please contact Ms.Jiting Sheng, email:jtsheng[at]fudan.edu.cn, tel. +86-21-65643438)

Registration on site: 14 Oct. 2012 (whole day)

Registration Fee:
Normal: RMB 1000; Student: RMB 800; Industrial: RMB 2000.

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